KOSE Clear Turn Face Mask (40-50 sheets) Made in Japan Select Your Preferred Type! - Tokyo Sakura Mall

Ingredients: Water, Butylene Glycol, Glycerin, DPG, PEG-8, Glycosyl Trehalose, Sodium Chondroitin Sulfate, Succinyl Atelocollagen, Serine, Sodium Hyaluronate, Bifida Ferment Lysate, Hydrolyzed Collagen, Soluble Collagen, Soy Milk Ferment Filtrate, EDTA-2Na, Ethanol, Xanthan Gum, Glycereth-26, Methyl Gluceth-10, Disodium Phosphate, Sodium Phosphate, Hydrolyzed Hydrogenated Starch, Ethylparaben, Phenoxyethanol, Methylparaben, Sodium Benzoate KOSE Clear Turn EX Ultra Rich Moisturizing Face Mask (40 Sheets) Usage Instructions: Use the mask immediately after taking it out. For hygiene reasons, do not reuse a mask. After sunburn, use only after redness and heat have subsided. Do not use for an extended period or sleep with the mask on. Do not flush the sheet, as it does not dissolve in water. Storage Instructions: To prevent quality deterioration from drying, close the zipper tightly after use. After opening, store with the zipper facing upward to prevent leakage. Use within 100 days after opening. Store in a cool, dry place, away from direct sunlight. Keep out of reach of infants and children. Any unevenness in the essence may occur, but this does not affect the quality. Ingredients: Water, DPG, Butylene Glycol, Glycerin, Ethanol, Argania Spinosa Kernel Oil, Serine, Tocopherol, Sodium Hyaluronate, Polyquaternium-51, Meadowfoam Seed Oil, Ubiquinone, Soluble Collagen, EDTA-2Na, PEG-20 Hydrogenated Castor Oil, Cetearyl Alcohol, Tetraoleate Sorbeth-30, Polysorbate 80, Mineral Oil, Disodium Phosphate, Sodium Phosphate, Phenoxyethanol, Methylparaben KOSE Clear Turn EX Plumping Mask (50 Sheets, Anti-Wrinkle & Moisturizing Face Mask) Product Introduction: Contains CICA ingredient (Centella Asiatica Extract). Designed to soothe skin irritated by daily external stressors like mask friction and dryness, promoting healthier skin. Ingredients: Water, Butylene Glycol, DPG, Glycerin, PPG-10 Methyl Glucose Ether, Glycosyl Trehalose, Sage Oil, Centella Asiatica Leaf Extract, Houttuynia Cordata Extract, Sodium Hyaluronate, Lactobacillus/Pear Juice Ferment Filtrate, EDTA-2Na, PEG-8, Acrylates/Alkyl Acrylate (C10-30) Crosspolymer, Isostearoyl PEG-50 Hydrogenated Castor Oil, Xanthan Gum, Diglycerin, Triethylhexanoin, Hydrolyzed Hydrogenated Starch, Sodium Hydroxide, Phenoxyethanol, Methylparaben KOSE Clear Turn CICA Moist Mask (40 Sheets, Low Irritation, Large Capacity) Product Introduction: Contains CICA ingredient (Centella Asiatica Extract). Formulated to soothe skin irritated by daily external stressors like mask friction and dryness, leading to healthier skin. Ingredients: Water, Butylene Glycol, DPG, Glycerin, PPG-10 Methyl Glucose Ether, Glycosyl Trehalose, Sage Oil, Centella Asiatica Leaf Extract, Houttuynia Cordata Extract, Sodium Hyaluronate, Lactobacillus/Pear Juice Ferment Filtrate, EDTA-2Na, PEG-8, Acrylates/Alkyl Acrylate (C10-30) Crosspolymer, Isostearoyl PEG-50 Hydrogenated Castor Oil, Xanthan Gum, Diglycerin, Triethylhexanoin, Hydrolyzed Hydrogenated Starch, Sodium Hydroxide, Phenoxyethanol, Methylparaben